Ferroelectric dielectrics integrated on silicon
This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book empha...
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
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London : Hoboken, N.J. :
ISTE Ltd. ; John Wiley
2011.
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| Edición: | 1st edition |
| Colección: | ISTE
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| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009628498506719 |
| Sumario: | This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterizat |
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| Notas: | Adapted and updated from: Dielectriques ferroelectriques integres sur silicium, published in France by Hermes Science/Lavoisier, 2011. |
| Descripción Física: | 1 online resource (464 p.) |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9781118602751 9781118602768 9781118602805 |
