In-situ characterization of thin film growth
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an impo...
| Otros Autores: | , |
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
Cambridge ; Philadelphia, Pa. :
Woodhead Pub
2011.
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| Edición: | 1st edition |
| Colección: | Woodhead Publishing Series in Electronic and Optical Materials
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| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009628227806719 |
| Sumario: | Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapte |
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| Notas: | Description based upon print version of record. |
| Descripción Física: | 1 online resource (295 p.) |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9780857094957 |
