Characterization in silicon processing editor, Yale Strusser [and three others] ; design, Christopher Simon ; contributors, Roc Blumenthal [and sixteen others]

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Detalles Bibliográficos
Otros Autores: Strausser, Yale, author (author), Strausser, Yale, editor (editor), Simon, Christopher, book designer (book designer), Blumenthal, Roc, contributor (contributor)
Formato: Libro electrónico
Idioma:Inglés
Publicado: Stoneham, Massachusetts ; Greenwich, Connecticut : Butterworth-Heinemann 1993.
Edición:1st edition
Colección:Materials characterization series.
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009627934406719
Descripción
Sumario:This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Notas:Description based upon print version of record.
Descripción Física:1 online resource (255 p.)
Bibliografía:Includes bibliographical references at the end of each chapters and index.
ISBN:9780080523422