Silicon technologies ion implantation and thermal treatment
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
London : Hoboken, N.J. :
ISTE ; Wiley
2011.
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| Edición: | 1st edition |
| Colección: | ISTE
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| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009627752306719 |
| Sumario: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Notas: | Description based upon print version of record. |
| Descripción Física: | 1 online resource (357 p.) |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9781118601044 9781118601143 9781118601112 9781299187535 |
