Ion Implantation

Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new material...

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Detalles Bibliográficos
Otros Autores: Mark Goorsky (auth), Goorsky, Mark, editor (editor)
Formato: Libro electrónico
Idioma:Inglés
Publicado: London, England : IntechOpen 2012
2012.
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009427349106719
Descripción
Sumario:Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Descripción Física:1 online resource (448 pages) : illustrations
Bibliografía:Includes bibliographical references.
ISBN:9789535142928