Tabla de Contenidos: “…Parasitic Sources in MOSFET StructureLithography of Nanoscaled MOSFETs; Sidewall Transfer Lithography; Part Two: Strain Engineering in Group IV Materials; Strain Design for MOSFETs; Strain Effect on Carrier Mobility; Basic Definitions; Carrier Mobility in MOSFETs with Strained Si Channel; Strain and Critical Thickness; Global Critical Thickness of SiGe Layers; Critical Thickness of SiGe Layers on Patterned Substrates; Critical Thickness of SiGe Layers Grown on Nano Features; Strain Measurements and Applications; Strain Measurement; Raman Spectroscopy; TEM Analysis…”