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- atomic layer deposition (ALD)
- 0.1 and 0.6 molar solution 1
- 2D material 1
- 2DEG density 1
- Al2O3 1
- AlGaN/GaN 1
- CMOS power amplifier IC 1
- Ce3+/Eu2+ 1
- Green's function 1
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- InAlN/GaN heterostructure 1
- L-shaped tunnel field-effect-transistor 1
- MISHEMT 1
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- WC-CoCr 1
- ZnO films 1
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- abrasive wear resistance 1
- aluminide coatings 1
- anodizing 1
- back current blocking layer (BCBL) 1
- band-to-band tunneling 1
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2Publicado 2022Libro electrónico