Advanced Interconnect and Packaging

Unlike transistors, the continuous downscaling of feature size in CMOS technology leads to a dramatic rise in interconnect resistivity and concomitant performance degradation. At nanoscale technology nodes, interconnect delay and reliability become the major bottlenecks faced by modern integrated ci...

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Detalles Bibliográficos
Otros Autores: Zhao, Wensheng, editor (editor)
Formato: Libro electrónico
Idioma:Inglés
Publicado: Basel : MDPI - Multidisciplinary Digital Publishing Institute 2023.
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009740902606719

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