Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
Basel, Switzerland
MDPI - Multidisciplinary Digital Publishing Institute
2020
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| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009654447406719 |
