Micro- and Nano-Fabrication by Metal Assisted Chemical Etching

Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes...

Descripción completa

Detalles Bibliográficos
Otros Autores:	Romano, Lucia (Editor)
Formato:	Libro electrónico
Idioma:	Inglés
Publicado:	Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
Materias:	History of engineering & technology porous silicon Pd nanoparticles-assisted chemical etching etching rate ethanol electrooxidation X-ray diffractive optics zone plate high aspect ratio nanostructures metal-assisted chemical etching electroless deposition Al2O3 nanotube ultra-high aspect ratio gold (Au) metal assisted chemical etching atomic layer deposition anisotropic dry etching silicon cones metal assisted chemical etching transversal pores antireflection black GaAs photon recycling X-ray grating interferometry catalyst silicon gold electroplating magnetically guided metal-assisted chemical etching bulk Si etching curved Si structure catalyst encapsulation
Ver en Biblioteca Universitat Ramon Llull:	https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009653962206719