Computational lithography

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since th...

Descripción completa

Detalles Bibliográficos
Autor principal: Ma, Xu, 1983- (-)
Otros Autores: Arce, Gonzalo R.
Formato: Libro electrónico
Idioma:Inglés
Publicado: Oxford : Wiley-Blackwell 2010.
Edición:1st edition
Colección:Wiley series in pure and applied optics.
Materias:
Ver en Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009628200706719

Ejemplares similares