Microfabrication for industrial applications
This book focuses on the industrial perspective for micro- and nanofabrication methods including large-scale manufacturing, transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. It gives a history of miniaturization, micro- and nanofabrication, and surveys industr...
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| Formato: | Libro electrónico |
| Idioma: | Inglés |
| Publicado: |
Oxford ; Waltham, MA :
William Andrew
2011.
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| Edición: | 1st edition |
| Colección: | Micro and Nano Technologies
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| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009627972206719 |
Tabla de Contenidos:
- Front Cover; Microfabrication forIndustrial Applications; Copyright; Table of Contents; Preface; Author Biography; Chapter 1 Introduction; 1.1 Philosophy of Micro/Nanofabrication; 1.2 The Industry-Science Dualism; 1.3 Industrial Applications; 1.4 Purpose and Organization of this Book; References; Chapter 2 Basic Technologies for Microsystems; 2.1 Photolithography; 2.2 Thin Films; 2.2.1 Wet Deposition Techniques; 2.2.2 Vapor Deposition Techniques; 2.3 Silicon Micromachining; 2.3.1 Etching; Wet Chemical Etching; Dry Etching; 2.3.2 Surface Micromachining; 2.3.3 Silicon Bulk Micromachining
- Anisotropic Wet Chemical EtchingBosch Process; 2.4 Industrially Established Non-Silicon Processing; 2.4.1 Quartz Etching; 2.4.2 Glass Wet Etching; 2.4.3 Photostructurable Glass; 2.4.4 Powder Blasting; 2.4.5 Plastic Microfabrication; Thick Resist Lithography; Laser Ablation; Photopolymerization; Thermoplastic Micromolding; 2.5 Conclusions; References; Chapter 3 Advanced Microfabrication Methods; 3.1 LIGA; 3.2 Deep Reactive Ion Etching; 3.3 Micro-Ceramic Processing; 3.3.1 Micromolding; 3.3.2 Ceramic Microparts by LIGA; 3.3.3 Utilizing Capillaries for Ceramic Micromolding
- 3.3.4 Utilizing Soft-Mold Replication3.3.5 Ceramic Patterning on Curved Substrates; 3.3.6 Patterning Ceramic Materials at Nanoscale Resolution; 3.4 Speciality Substrates; 3.4.1 Silicon-on-Insulator (SOI); 3.4.2 Electro-Optic Substrates; 3.5 Advanced Non-Silicon and Silicon Hybrid Devices; 3.5.1 Nanofabrication of Information Storage Devices; 3.5.2 Integrated Optics; 3.6 Planar Lightwave Circuits; 3.7 Fabrication Example of an Integrated Optical Device; 3.8 Integrated Optics in the MST Foundry Service Industry: A Case Study; 3.9 Conclusions; References; Chapter 4 Nanotechnology
- 4.1 Top-Down, Bottom-Up4.1.1 Nanolithography; 4.1.2 Introduction to the Need for New Lithographic Techniques; 4.1.3 Nanolithographic Techniques; 4.1.4 Top-Down Nanolithographic Principles; 4.1.5 Nanolithographic Technologies for the Microelectronics Industry; Deep Ultraviolet (DUV) Lithography; Extreme Ultraviolet (EUV) Lithography; 4.1.6 Nanoimprint Technology; 4.1.7 Case Studies: Nanoimprint Applications; Patterned Magnetic Media; Random Access Memory; Surface-Acoustic-Wave Devices; 4.1.8 Emerging Nanolithographic Technologies; Multiple E-Beam/Ion-Beam Lithography; Templated Nanoarrays
- 4.1.9 Nanolithography in R&DDUV Interference Nanolithography; EUV Interference Nanolithography; Atom Lithography; 4.1.10 LIL Development at MESA+ NanoLab NL; Multi-exposures and Novel Resist Systems for 266 nm LIL; 4.1.11 Case Study: Laser Interference Lithography Nanoarraysfor Cell Biology; 4.1.12 Concluding Remarks on Emerging Nanolithography; 4.2 Nanomaterials; 4.2.1 Ordered Oxides; 4.2.2 Oxide Nanoarrays: Definitions and Background; Natural versus Artificial Oxide Nanoarrays; Oxide Metamaterials: How Do They Differ from Nanoarrays?; Curiosity-Driven Research on Nanoscale Metamaterials
- Application-Driven Research on Nanoscale Oxide Metamaterials
