Nano-CMOS gate dielectric engineering

According to Moore's Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the...

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Bibliographic Details
Main Author: Wong, Hei (-)
Format: eBook
Language:Inglés
Published: Boca Raton : CRC Press 2012.
Edition:1st edition
Subjects:
See on Biblioteca Universitat Ramon Llull:https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991009627662906719
Description
Summary:According to Moore's Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics,
Item Description:Description based upon print version of record.
Physical Description:1 online resource (245 p.)
Bibliography:Includes bibliographical references.
ISBN:9781315217390
9781283350457
9786613350459
9781439849606