Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications
| Autor principal: | |
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| Formato: | Libro |
| Idioma: | Inglés |
| Publicado: |
Westwood, NJ :
Noyes Publications
cop. 1992
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| Edición: | Reimpr |
| Colección: | Materials science and process technology series. Electronic materials and process technology
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| Materias: | |
| Ver en Biblioteca Universitat Ramon Llull: | https://discovery.url.edu/permalink/34CSUC_URL/1im36ta/alma991002942139706719 |
