Cita APA (7a ed.)

Schmitz, J. E. J. (1992). Chemical vapor deposition of tungsten and tungsten silicides: For VLSI/ULSI applications (Reimpr.). Noyes Publications.

Cita Chicago Style (17a ed.)

Schmitz, John E. J. Chemical Vapor Deposition of Tungsten and Tungsten Silicides: For VLSI/ULSI Applications. Reimpr. Westwood, NJ: Noyes Publications, 1992.

Cita MLA (9a ed.)

Schmitz, John E. J. Chemical Vapor Deposition of Tungsten and Tungsten Silicides: For VLSI/ULSI Applications. Reimpr. Noyes Publications, 1992.